Michael Sebald: search on Z-Library

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1

And If I Remained by the Outermost Sea (From after Nature)

W. G. Sebald and Michael Hamburger

Journal:

The Threepenny Review

Year:

2002

Language:

english

File:

PDF, 1.59 MB

english, 2002

2

Inaugural Issue: Belfast in Europe || After Nature

W. G. Sebald and Michael Hamburger

Journal:

Year:

2002

Language:

english

File:

PDF, 382 KB

english, 2002

3

The Justice Issue || A Final Poem: Marienbad Elegy

W. G. Sebald and Michael Hamburger

Journal:

Year:

2002-2003

Language:

english

File:

PDF, 424 KB

english, 2002-2003

4

Six Poems

W. G. Sebald, Hans Magnus Enzensberger and Michael Hamburger

Journal:

World Literature Today

Year:

2005

Language:

english

File:

PDF, 564 KB

english, 2005

5

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Application aspects of the Si-CARL bilayer process

Sebald, Michael, Berthold, Joerg, Beyer, Michael, Leuschner, Rainer, Noelscher, Christoph, Scheler, Ulrich, Sezi, Recai, Ahne, Hellmut, Birkle, Siegfried, Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 607 KB

english, 1991

6

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Recent advances in fluorinated resists for application at 157 nm

Houlihan, Francis M., Sturtevant, John L., Sakamuri, Raj, Romano, Andrew, Rentkiewicz, David, Dammel, Ralph R., Conley, Willard E., Miller, Daniel A., Sebald, Michael, Stepanenko, Nickolay, Markert, M

Year:

2004

Language:

english

File:

PDF, 1.70 MB

english, 2004

7

The Top-CARL, process: A patterning technique for organic materials

Dr. Rainer Leuschner, Hellmut Ahne, Albert Hammerschmidt, Günter Kolodziej, Jens Nordmann, Erwin Schmidt, Michael Sebald, Recai Sezi

Journal:

Advanced Materials

Year:

1992

Language:

english

File:

PDF, 394 KB

english, 1992

8

Polyethylenimine–PEG coated albumin nanoparticles for BMP-2 delivery

Sufeng Zhang, Cezary Kucharski, Michael R. Doschak, Walter Sebald, Hasan Uludağ

Journal:

Year:

2010

Language:

english

File:

PDF, 915 KB

english, 2010

9

A modular interface of IL-4 allows for scalable affinity without affecting specificity for the IL-4 receptor

Michael Kraich, Markus Klein, Edwin Patiño, Henning Harrer, Joachim Nickel, Walter Sebald, Thomas D Mueller

Journal:

Year:

2006

Language:

english

File:

PDF, 3.82 MB

english, 2006

10

Functionalized polymers for high-resolution photolithography

Michael Sebald, Hellmut Ahne, Rainer Leuschner, Recai Sezi

Journal:

Polymers for Advanced Technologies

Year:

1994

Language:

english

File:

PDF, 1.54 MB

english, 1994

11

Radiation-Induced Reduction of BMP-Induced Proteoglycan Synthesis in an Embryonal Mesenchymal Tissue Equivalent Using the Chicken “Limb Bud” Test

Oliver Koelbl, Petra Knaus, Fabian Pohl, Michael Flentje, Walter Sebald

Journal:

Strahlentherapie und Onkologie

Year:

2001

File:

PDF, 266 KB

2001

12

Modulation of GDF5/BRI-b signalling through interaction with the tyrosine kinase receptor Ror2

Marei Sammar, Sigmar Stricker, Georg C. Schwabe, Christina Sieber, Anke Hartung, Michael Hanke, Isao Oishi, Jens Pohl, Yasuhiro Minami, Walter Sebald, Stefan Mundlos, Petra Knaus

Journal:

Year:

2004

Language:

english

File:

PDF, 428 KB

english, 2004

13

Dimerization of signalling modules of the EvgAS and BvgAS phosphorelay systems

Anne-Laure Perraud, Karsten Rippe, Marcus Bantscheff, Michael Glocker, Magnus Lucassen, Kirsten Jung, Walter Sebald, Verena Weiss, Roy Gross

Journal:

Biochimica et Biophysica Acta (BBA) - Protein Structure and Molecular Enzymology

Year:

2000

Language:

english

File:

PDF, 524 KB

english, 2000

14

Optical lithography and O2/RIE pattern transfer characteristics of the silicon-containing positiv resist (SPR)

Rainer Leuschner, Recai Sezi, Michael Sebald, Guenter Czech, Dietrich Stephani

Journal:

Microelectronic Engineering

Year:

1989

Language:

english

File:

PDF, 855 KB

english, 1989

15

Interleukin-6 administration has no acute hemodynamic or hematologic effect in the dog

Preiser, Jean-Charles, Schmartz, Denis, Van der Linden, Philippe, Content, Jean, Vanden Bussche, Paul, Buurman, Wim, Sebald, Walter, Dupont, Etienne, Pinsky, Michael R., Vincent, Jean-Louis

Journal:

Year:

1991

Language:

english

File:

PDF, 415 KB

english, 1991

16

An Excerpt from "Vertigo"

W. G. Sebald and Michael Hulse

Journal:

Year:

2000

Language:

english

File:

PDF, 685 KB

english, 2000

17

Destructive or Cooperative Attack of Iodide Anions on Alkyltriiodophosphonium Cations: Elimination of Iodine in Solution and Layer Structures in the Solid State

du Mont, Wolf-Walther, Stenzel, Volkmar, Jeske, Joerg, Jones, Peter G., Sebald, Angelika, Pohl, Siegfried, Saak, Wolfgang, Baetcher, Michael

Journal:

Inorganic Chemistry

Year:

1994

Language:

english

File:

PDF, 460 KB

english, 1994

18

Alkoxigermanate(II), -stannate(II) und -plumbate(II) zweiwertiger Metallionen, I [1] / Alkoxigermanates(II), -stannates(II) and -plumbates(II) of Two-Valent Metal Ions, I [1]

Veith, Michael, Hans, Johannes, Stahl, Lothar, May, Peter, Huch, Volker, Sebald, Angelika

Journal:

Zeitschrift für Naturforschung B

Year:

1991

File:

PDF, 18.56 MB

1991

19

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Benefits and prospects of aqueous silylation for novel dry developable high-resolution resists

Sezi, Recai, Sebald, Michael, Leuschner, Rainer, Ahne, Hellmut, Birkle, Siegfried, Borndoerfer, Horst, Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 440 KB

english, 1990

20

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Chemical amplification of resist lines: a novel sub-half-micron bilayer resist tehnique for NUV and deep-UV lithography

Sebald, Michael, Leuschner, Rainer, Sezi, Recai, Ahne, Hellmut, Birkle, Siegfried, Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 542 KB

english, 1990

21

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Study of 157 nm resists with full field exposure tools

Wei, Yayi, Sturtevant, John L., Stepanenko, Nickolay, Sebald, Michael, Hohle, Christoph, Houlihan, Francis M., Sakamuri, Raj, Dimerli, Alla, Romano, Andrew, Dammel, Ralph R.

Year:

2005

Language:

english

File:

PDF, 595 KB

english, 2005

22

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Study of barrier coats for protection against airborne contamination in 157-nm lithography

Houlihan, Francis, Sturtevant, John L., Sakamuri, Raj, Hamilton, Keino, Dimerli, Alla, Rentkiewicz, David, Romano, Andrew, Dammel, Ralph R., Wei, Yayi, Stepanenko, Nickolay, Sebald, Michael, Hohle, Ch

Year:

2005

Language:

english

File:

PDF, 3.08 MB

english, 2005

23

31 P and 13 C chemical shielding tensors in the phosphoenolpyruvate moiety from rotary resonance recoupling 13 C and 31 P MAS and single crystal 31 P NMR

BECHMANN, MATTHIAS, DUSOLD, STEPHAN, FÖRSTER, HANS, HAEBERLEN, ULRICH, LIS, TADEUSZ, SEBALD, ANGELIKA, STUMBER, MICHAEL

Journal:

Molecular Physics

Year:

2000

Language:

english

File:

PDF, 1.36 MB

english, 2000

24

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Interference patterning of gratings with a period of 150 nm at a wavelength of 157 nm

Fuetterer, Gerald, Herbst, Waltraud, Rottstegge, Joerg, Ferstl, Margit, Sebald, Michael, Schwider, Johannes, Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 542 KB

english, 2002

25

Dedicated polymers for future progress in microelectronics

Rubner, Roland, Ahne, Hellmut, Sebald, Michael, Sezi, Recai

Journal:

Makromolekulare Chemie Macromolecular Symposia

Year:

1992

Language:

english

File:

PDF, 385 KB

english, 1992

26

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Novel fluoro copolymers for 157-nm photoresists: a progress report

Hohle, Christoph, Hien, Stefan, Eschbaumer, Christian, Rottstegge, Joerg, Sebald, Michael, Fedynyshyn, Theodore H.

Year:

2002

Language:

english

File:

PDF, 668 KB

english, 2002

27

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Negative-tone resist for phase-shifting mask technology: a progress report

Richter, Ernst, Houlihan, Francis M., Elian, Klaus, Hien, Stefan, Kuehn, Eberhard, Sebald, Michael, Shirai, Masamitsu

Year:

2000

Language:

english

File:

PDF, 1.09 MB

english, 2000

28

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Ultrathin film imaging at 157 nm

Rottstegge, Joerg, Fedynyshyn, Theodore H., Herbst, Waltraud, Hien, Stefan, Fuetterer, Gerald, Eschbaumer, Christian, Hohle, Christoph, Schwider, Johannes, Sebald, Michael

Year:

2002

Language:

english

File:

PDF, 774 KB

english, 2002

29

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Performance of chemically amplified resists at half-pitch of 45 nm and below

Wei, Yayi, Lin, Qinghuang, Bender, Markus, Domke, Wolf-Dieter, Laessig, Antje, Sebald, Michael, Trogisch, Sven, Back, David

Year:

2007

Language:

english

File:

PDF, 409 KB

english, 2007

30

Chemically Amplified Main Chain Scission: Chopping the Influence of Polymer Dimensions on Line Edge Roughness

Eschbaumer, Christian, Heusinger, Nicole, Kern, Marion, Jutgla, Angela, Hohle, Christoph, Sebald, Michael

Journal:

Journal of Photopolymer Science and Technology

Year:

2003

File:

PDF, 2.10 MB

2003

31

Chemically Amplified Main Chain Scission: New Concept to Reduce Line Edge Roughness and Outgassing.

Eschbaumer, Christian, Heusinger, Nicole, Hohle, Christoph, Sebald, Michael

Journal:

Journal of Photopolymer Science and Technology

Year:

2002

Language:

english

File:

PDF, 620 KB

english, 2002

32

Thin film imaging with CARL photoresist at the optical resolution limit.

Hien, Stefan, Czech, Günther, Domke, Wolf-Dieter, Richter, Ernst, Sebald, Michael, Stiebert, Iris

Journal:

Journal of Photopolymer Science and Technology

Year:

1999

Language:

english

File:

PDF, 474 KB

english, 1999

33

[ASME ASME 2015 International Mechanical Engineering Congress and Exposition - Houston, Texas, USA (Friday 13 November 2015)] Volume 3: Biomedical and Biotechnology Engineering - Orthopedic Anterior Cruciate Ligament Evaluator (OR.A.C.L.E): A Preliminary Design

Piovesan, Davide, Church, David, Herron, Sean, Oldham, Calvin, Sebald, Mollie, Michael, Robert, Bitticker, Steven

Year:

2015

Language:

english

File:

PDF, 1.87 MB

english, 2015

34

First Synthesis of (−)-Altenuene-D3 Suitable as Internal Standard for Isotope Dilution Mass Spectrometry

Sebald, Michael A., Gebauer, Julian, Sommerfeld, Thomas, Koch, Matthias

Journal:

Year:

2019

File:

PDF, 2.08 MB

2019

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